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In situ scanning tunneling microscopy of InAs quantum dots on GaAs(001) during molecular beam epitaxial growth

机译:GaAs(001)分子束外延生长过程中InAs量子点的原位扫描隧道显微镜

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摘要

Arrays of InAs quantum dots (QDs) have been studied using in situ scanning tunneling microscopy (STM) during their growth by molecular beam epitaxy on GaAs(001). At a substrate temperature of 400 ℃ under As4 flux, both the QDs and the underlying step-terrace structure of the wetting layer (WL) are found to be static, with neither step-flow nor QD ripening observed. Higher resolution images of the mature WL show slightly different [110] periodicities to those observed in quenched STM studies.
机译:在InAs量子点(QD)阵列上通过GaAs(001)上的分子束外延生长过程中,已经使用原位扫描隧道显微镜(STM)研究了InAs量子点阵列。在As4助熔剂下于400℃的衬底温度下,发现润湿层(WL)的QD和下面的阶梯-阶梯结构都是静态的,没有观察到步进流动和QD熟化。成熟的WL的高分辨率图像显示的[110]周期与淬灭STM研究中观察到的周期略有不同。

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