首页> 外文期刊>Surface Science >Stability of In rows on Si(100) during STM observation
【24h】

Stability of In rows on Si(100) during STM observation

机译:STM观察期间Si(100)上In行的稳定性

获取原文
获取原文并翻译 | 示例
           

摘要

Structural and dynamical properties of In rows grown on the Si(100)2×1 surface were studied in detail by the scanning tunneling microscopy at room temperature. The rows on terraces are preferably pinned to C-type defects, the unpinned ends detach and attach In atoms during observation. Evolution of the rows was recorded with single atom precision. Time constants for detachment of atoms from the rows were measured as a function of row length; a stabilizing effect of the C-type defects was quantified. Dynamics of the In rows was found to depend on tunneling voltage. An effect of electric field is proposed to be responsible for the influence.
机译:在室温下通过扫描隧道显微镜详细研究了在Si(100)2×1表面生长的In行的结构和动力学性质。平台上的行最好固定在C型缺陷上,未固定的末端在观察过程中分离并附着In原子。以单原子精度记录行的演变。测量原子从行中分离的时间常数作为行长的函数。量化了C型缺陷的稳定作用。发现In行的动力学取决于隧道电压。电场的影响被认为是造成这种影响的原因。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号