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Interface modification of two-step grown InGaN/GaN superlattices preparing layers for InGaN-based green LED on silicon substrate

机译:两步生长的InGaN / GaN超晶格的界面改性为硅衬底上的基于InGaN的绿色LED制备层

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摘要

In this paper, the influence of InGaN/GaN superlattices preparing layers (SPL) on the optoelectrical properties of InGaN/GaN green LED is investigated by a single or two-step growth of SPL. It is found that two-step growth of SPL leads to an abnormal turn-on behavior of such LED chips, accompanied by a drastically increased operating voltage and sharply degraded quantum efficiency. Interface modification by heavy Si-doping successfully solves the abnormal turn-on behavior and realizes a significantly enhanced wall-plug efficiency and lower operating voltage. The underlying physical mechanisms are discussed and analyzed theoretically by the simulation calculation.
机译:本文通过单步或两步生长SPL研究了InGaN / GaN超晶格制备层(SPL)对InGaN / GaN绿色LED光电性能的影响。发现SPL的两步生长导致这种LED芯片的异常开启行为,伴随着工作电压的急剧增加和量子效率的急剧下降。通过重掺杂Si进行的接口修改成功解决了异常的导通行为,并显着提高了壁挂效率和更低的工作电压。通过仿真计算,从理论上讨论和分析了潜在的物理机制。

著录项

  • 来源
    《Superlattices and microstructures》 |2019年第2期|120-124|共5页
  • 作者单位

    Nanchang Univ, Natl Inst LED Si Substrate, Nanchang 330096, Jiangxi, Peoples R China;

    Nanchang Univ, Natl Inst LED Si Substrate, Nanchang 330096, Jiangxi, Peoples R China;

    Nanchang Univ, Natl Inst LED Si Substrate, Nanchang 330096, Jiangxi, Peoples R China;

    Nanchang Univ, Natl Inst LED Si Substrate, Nanchang 330096, Jiangxi, Peoples R China;

    Nanchang Univ, Natl Inst LED Si Substrate, Nanchang 330096, Jiangxi, Peoples R China;

    Nanchang Univ, Natl Inst LED Si Substrate, Nanchang 330096, Jiangxi, Peoples R China;

    Nanchang Univ, Natl Inst LED Si Substrate, Nanchang 330096, Jiangxi, Peoples R China;

    Nanchang Univ, Natl Inst LED Si Substrate, Nanchang 330096, Jiangxi, Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    InGaN; Green LEDs; Silicon substrate; Superlattices; Epitaxial growth; Simulation and modelling;

    机译:InGaN;绿色LED;硅衬底;超晶格;外延生长;模拟与建模;

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