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Porous silicon layers prepared by electrochemical etching for application in silicon thin film solar cells

机译:通过电化学蚀刻制备的多孔硅层,用于硅薄膜太阳能电池

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摘要

In this paper, multilayer structures of porous silicon were fabricated by using electrochemical etching and characterized for its optical properties and surface morphology. Samples of monolayer of porous silicon were grown to study the characteristics of porous layer formation with respect to applied current density, etching time and hydrofluoric acid concentrations. Photoluminescence peaks of red emission at wavelength 695 and 650 nm were observed from multilayer porous silicon structures. By atomic force microscopy measurement, hillocks like surface were clearly observed within the host material, which confirmed the formation of pores.
机译:本文采用电化学刻蚀的方法制备了多孔硅的多层结构,并对其光学性能和表面形貌进行了表征。生长多孔硅单层样品以研究关于施加电流密度,蚀刻时间和氢氟酸浓度的多孔层形成特性。从多层多孔硅结构中观察到了在波长695和650 nm处红色发射的光致发光峰。通过原子力显微镜测量,在主体材料内清楚地观察到小丘状表面,这证实了孔的形成。

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