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Enhanced output power of near-ultraviolet LEDs with AlGaN/GaN distributed Bragg reflectors on 6H-SiC by metal-organic chemical vapor deposition

机译:通过金属有机化学气相沉积在6H-SiC上使用AlGaN / GaN分布的Bragg反射镜增强近紫外LED的输出功率

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摘要

Near-ultraviolet (UV) InGaN/AlGaN multiple quantum well (MQW) LEDs with 30 pairs AlGaN/GaN distributed Bragg reflectors (DBRs) were grown on 6H-SiC substrate by metal-organic chemical vapor deposition. A thin SiN_x interlayer was introduced between the DBRs and n-GaN layer of the LED to reduce the threading dislocation density and result in enhancement the internal quantum efficiency (η_(int)) of the InGaN/AlGaN LED. The result indicates that the light output power for the LED with DBRs and SiN_x interlayer was approximately 56% higher (at 350 mA) than the LED without DBRs and SiN_x interlayer on 6H-SiC substrate, and this significant improvement in performance is attributed not only to the light extraction enhancement via the DBRs but also due to improve epilayer crystalline quality.
机译:通过金属有机化学气相沉积法,在6H-SiC衬底上生长具有30对AlGaN / GaN分布布拉格反射器(DBR)的近紫外InGaN / AlGaN多量子阱(MQW)LED。在LED的DBR和n-GaN层之间引入了一层薄的SiN_x中间层,以减少穿线位错密度并提高InGaN / AlGaN LED的内部量子效率(η_(int))。结果表明,在6H-SiC衬底上,具有DBR和SiN_x夹层的LED的光输出功率(在350 mA下)比不具有DBR和SiN_x夹层的LED的光输出功率高大约56%。通过DBR提高光提取效率,也归因于改善了外延层的晶体质量。

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  • 来源
    《Superlattices and microstructures》 |2015年第9期|482-487|共6页
  • 作者单位

    School of Physics and Optoelectronic Engineering, Dalian University of Technology, Dalian 116024, People's Republic of China;

    School of Physics and Optoelectronic Engineering, Dalian University of Technology, No. 2, Linggong Road, High-tech Park, Dalian 116024, People's Republic of China;

    School of Physics and Optoelectronic Engineering, Dalian University of Technology, Dalian 116024, People's Republic of China;

    School of Physics and Optoelectronic Engineering, Dalian University of Technology, Dalian 116024, People's Republic of China;

    Jiangsu Xinguanglian Technology Company Ltd., Wuxi 214101, People's Republic of China;

    Jiangsu Xinguanglian Technology Company Ltd., Wuxi 214101, People's Republic of China;

    School of Physics and Electronic Technology, Liaoning Normal University, Dalian 116029, People's Republic of China;

    School of Physics and Optoelectronic Engineering, Dalian University of Technology, Dalian 116024, People's Republic of China;

    School of Physics and Optoelectronic Engineering, Dalian University of Technology, Dalian 116024, People's Republic of China;

    School of Physics and Optoelectronic Engineering, Dalian University of Technology, Dalian 116024, People's Republic of China,State Key Laboratory on Integrated Optoelectronics, School of Electronic Science and Engineering, Jilin University, Changchun 130012, People's Republic of China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Silicon carbide; Ultraviolet light-emitting diode; Distributed Bragg reflector; SiN_x interlayer;

    机译:碳化硅;紫外线发光二极管;分布式布拉格反射器;SiN_x中间层;

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