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Trap behaviors in AlGaN/GaN based polarization-doped field effect transistors by frequency-dependent conductance-voltage characterizations

机译:AlGaN / GaN基极化掺杂场效应晶体管中随频率变化的电导电压特性的陷阱行为

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摘要

AlGaN/GaN polarization-doped field-effect transistors (PolFETs) were fabricated on the graded AlGaN/GaN heterojunctions grown by metal organic chemical vapor deposition, and the trap behaviors were first systemically evaluated by frequency-dependent conductance-voltage characterizations. It was found that there was no obvious effective traps accumulation in the graded AlGaN/GaN heterojunctions of the PolFETs due to the absence of abrupt heterostructure as in the traditional HFETs. The exactly exponential dependence of the trap state time constants on the bias voltage in PolFETs was observed, which was a typical characteristic for interface traps, indicating a multi-heterointerface feature of the PolFETs.
机译:在通过金属有机化学气相沉积生长的渐变AlGaN / GaN异质结上制造了AlGaN / GaN极化掺杂的场效应晶体管(PolFET),并首先通过频率相关的电导-电压表征系统地评估了陷阱行为。结果发现,由于没有传统的HFET中突然的异质结构,PolFET的渐变AlGaN / GaN异质结中没有明显的有效陷阱积累。观察到陷阱状态时间常数对PolFET中偏置电压的精确指数依赖性,这是界面陷阱的典型特征,表明PolFET的多异质界面特性。

著录项

  • 来源
    《Superlattices and microstructures》 |2015年第6期|201-206|共6页
  • 作者单位

    School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China,National Key Laboratory of ASIC, Hebei Semiconductor Research Institute, Shijiazhuang 050051, China;

    National Key Laboratory of ASIC, Hebei Semiconductor Research Institute, Shijiazhuang 050051, China;

    School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China;

    National Key Laboratory of ASIC, Hebei Semiconductor Research Institute, Shijiazhuang 050051, China;

    National Key Laboratory of ASIC, Hebei Semiconductor Research Institute, Shijiazhuang 050051, China;

    National Key Laboratory of ASIC, Hebei Semiconductor Research Institute, Shijiazhuang 050051, China;

    National Key Laboratory of ASIC, Hebei Semiconductor Research Institute, Shijiazhuang 050051, China;

    School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China;

    National Key Laboratory of ASIC, Hebei Semiconductor Research Institute, Shijiazhuang 050051, China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    AlGaN/GaN; Graded heterojunctions; Trap; Conductance-voltage;

    机译:AlGaN / GaN;分级异质结;陷阱;电导电压;

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