首页> 外文期刊>Superlattices and microstructures >Drain current versus drain voltage characteristics for an analytical Al0.25Ga0.75N/GaN superlattice MOSFET
【24h】

Drain current versus drain voltage characteristics for an analytical Al0.25Ga0.75N/GaN superlattice MOSFET

机译:分析型Al0.25Ga0.75N / GaN超晶格MOSFET的漏极电流与漏极电压的关系

获取原文
获取原文并翻译 | 示例

摘要

In present analysis initially authors have studied the variation of mobility with lattice temperature in Nitride based superlattice MOSFETs and have compared the results with temperature dependent measured mobility of two dimensional electrons in AlGaN/GaN superlattice structure. Based on these mobilities a superlattice MOSFET is designed in which static characteristics following different scattering mechanisms are discussed.
机译:在目前的分析中,最初的作者研究了基于氮化物的超晶格MOSFET中迁移率随晶格温度的变化,并将结果与​​AlGaN / GaN超晶格结构中二维电子随温度变化测得的迁移率进行了比较。基于这些迁移率,设计了一种超晶格MOSFET,其中讨论了遵循不同散射机制的静态特性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号