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RF power MOSFET device with extended linear region of transconductance characteristic at low drain current

机译:在低漏极电流下具有跨导特性的线性区域扩展的RF功率MOSFET器件

摘要

A semiconductor MOSFET device having a decreased length of the channel region is disclosed. In one embodiment of the device, each gate includes three gate subregions. An enhancement drift drain region underlies the first gate subregion, a channel region underlies the third gate subregion, and each enhancement drift drain region and each channel region are separated by an epitaxial region underlying the second gate subregion. The device of the present invention if used as an amplifier, has a more linear transfer characteristic, less cross talk and less channel interference than a conventional semiconductor MOSFET device having a conventional gate region without gate subregions.
机译:公开了一种具有减小的沟道区长度的半导体MOSFET器件。在该装置的一个实施例中,每个栅极包括三个栅极子区域。增强漂移漏极区位于第一栅极子区下方,沟道区位于第三栅极子区下方,并且每个增强漂移漏极区和每个沟道区都由位于第二栅极子区下方的外延区隔开。如果将本发明的器件用作放大器,则与具有不具有栅极子区域的常规栅极区域的常规半导体MOSFET器件相比,本发明的器件具有更线性的传输特性,更少的串扰和更少的沟道干扰。

著录项

  • 公开/公告号US6064088A

    专利类型

  • 公开/公告日2000-05-16

    原文格式PDF

  • 申请/专利权人 XEMOD INC.;

    申请/专利号US19980097532

  • 发明设计人 PABLO EUGENIO DANNA;

    申请日1998-06-15

  • 分类号H01L29/76;H01L29/94;H01L31/062;H01L31/113;H01L31/119;

  • 国家 US

  • 入库时间 2022-08-22 01:37:09

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