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Performance improvement of GaN-based near-UV LEDs with InGaN/AlGaN superlattices strain relief layer and AlGaN barrier

机译:具有InGaN / AlGaN超晶格应变消除层和AlGaN势垒的GaN基近紫外LED的性能改进

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摘要

The carrier confinement effect and piezoelectric field-induced quantum-confined stark effect of different GaN-based near-UV LED samples from 395 nm to 410 nm emission peak wavelength were investigated theoretically and experimentally. It is found that near-UV LEDs with InGaN/AlGaN multiple quantum wells (MQWs) active region have higher output power than those with InGaN/GaN MQWs for better carrier confinement effect. However, as emission peak wavelength is longer than 406 nm, the output power of the near-UV LEDs with AlGaN barrier is lower than that of the LEDs with GaN barrier due to more serious spatial separation of electrons and holes induced by the increase of piezoelectric field. The N-doped InGaN/AlGaN superlattices (SLs) were adopted as a strain relief layer (SRL) between n-GaN and MQWs in order to suppress the polarization field. It is demonstrated the output power of near-UV LEDs is increased obviously by using SLs SRL and AlGaN barrier for the discussed emission wavelength range. Besides, the forward voltage of near-UV LEDs with InGaN/AlGaN SLs SRL is lower than that of near-UV LEDs without SRL.
机译:从理论上和实验上研究了395 nm至410 nm发射峰波长下不同GaN基近紫外LED样品的载流子限制效应和压电场致量子限制斯塔克效应。发现具有InGaN / AlGaN多量子阱(MQW)有源区的近紫外LED具有比具有InGaN / GaN MQW的近紫外LED更高的输出功率,以实现更好的载流子限制效果。然而,由于发射峰波长长于406 nm,具有AlGaN势垒的近紫外LED的输出功率低于具有GaN势垒的LED的输出功率,这是由于压电的增加引起的电子和空穴的更严重的空间分离领域。为了抑制极化场,N掺杂的InGaN / AlGaN超晶格(SL)被用作n-GaN和MQW之间的应力消除层(SRL)。通过在讨论的发射波长范围内使用SLs SRL和AlGaN势垒,可以证明近紫外LED的输出功率明显增加。此外,具有InGaN / AlGaN SLs SRL的近紫外LED的正向电压低于不具有SRL的近紫外LED的正向电压。

著录项

  • 来源
    《Superlattices and microstructures》 |2016年第9期|417-423|共7页
  • 作者单位

    State Key Laboratory of Artificial Microstructure and Mesoscopic Physics, School of Physics, Peking University, Beijing 100871, China,Sino Nitride Semiconductor Co., Ltd, Dongguan 523500, China;

    State Key Laboratory of Artificial Microstructure and Mesoscopic Physics, School of Physics, Peking University, Beijing 100871, China;

    State Key Laboratory of Artificial Microstructure and Mesoscopic Physics, School of Physics, Peking University, Beijing 100871, China;

    State Key Laboratory of Artificial Microstructure and Mesoscopic Physics, School of Physics, Peking University, Beijing 100871, China;

    State Key Laboratory of Artificial Microstructure and Mesoscopic Physics, School of Physics, Peking University, Beijing 100871, China,Sino Nitride Semiconductor Co., Ltd, Dongguan 523500, China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Light-emitting diodes (LEDs); GaN-based; AlGaN barrier; Strain relief layer (SRL);

    机译:发光二极管(LED);GaN基;AlGaN势垒;应力消除层(SRL);

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