Modeling charge density in AlGaN/AlN/InGaN/GaN-based double heterostructures including InGaN layer strain relaxation

摘要

An analytical model is presented to calculate the two-dimensional electron gas (2DEG) density and barrier height of bare surface AlGaN/AlN/InGaN/GaN double heterostructures, which use InGaN as the conducting layer. The basic model is derived from electrostatic analysis of the different material interfaces. The effect of strain relaxation in the InGaN layer is also incorporated here. Further, the impact of a two-dimensional hole gas at the InGaN/GaN interface, formed when the InGaN layer thickness is high, has been considered. The presented results are seen to agree with the available experimental results. Thus, this model can be a useful tool in the design and modeling of InGaN-based III-nitride heterostructures.