首页> 外文期刊>IEEE Journal of Solid-State Circuits >A 7F2 cell and bitline architecture featuring tiltedarray devices and penalty-free vertical BL twists for 4-Gb DRAMs
【24h】

A 7F2 cell and bitline architecture featuring tiltedarray devices and penalty-free vertical BL twists for 4-Gb DRAMs

机译:7F2单元和位线架构,具有可倾斜的阵列器件和针对4 Gb DRAM的无损垂直BL扭曲

获取原文
获取原文并翻译 | 示例
           

摘要

A 7F2 DRAM trench cell and corresponding verticallynfolded bitline (BL) architecture has been fabricated using a 0.175 Μmntechnology. This concept features an advanced 30° tilted arrayndevice layout and an area penalty-free inter-BL twist. The presentednscheme minimizes local well noise by maximizing the number of twistingnintervals. A significant improvement of signal margin was measured on an32-Mbyte test chip
机译:已经使用0.175μm技术制造了7F2 DRAM沟槽单元和相应的垂直折叠位线(BL)结构。该概念采用先进的30°倾斜阵列器件布局和无损BL间扭曲。所提出的方案通过最大化扭曲间隔的数量来使局部井噪声最小化。在32 MB的测试芯片上测得的信号裕度有了显着提高

著录项

相似文献

  • 外文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号