首页> 外文期刊>Solid-State Circuits, IEEE Journal of >A High-Speed Low-Power Multi-VDD CMOS/SIMOX SRAM With LV-TTL Level Input/Output Pins—Write/Read Assist Techniques for 1-V Operated Memory Cells
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A High-Speed Low-Power Multi-VDD CMOS/SIMOX SRAM With LV-TTL Level Input/Output Pins—Write/Read Assist Techniques for 1-V Operated Memory Cells

机译:具有LV-TTL电平输入/输出引脚的高速低功耗多VDD CMOS / SIMOX SRAM —用于1V操作的存储单元的写/读辅助技术

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The use of multiple power supplies with different output voltages has a great advantage in that it makes it possible to realize high performance ULSIs with low power dissipation. This paper presents a high-speed low-power SRAM that employs three power supplies (1, 2, and 3.3 V). A 1-V power supply is mainly used in the SRAM core to save standby and/or active power, while a 2-V supply is used in critical components to realize high performance. The voltage applicable to each MOSFET is up to 2.2 V because of the use of a 5-nm ultrathin gate oxide, and so the 3.3-V power supply is used only for LV-TTL level I/O buffers. Secure write operation for 1-V six-transistor memory cells is guaranteed by using a new switched powerline impedance scheme. To reduce dynamic write power dissipation, a segmented bitline scheme is adopted and long global bitlines are assigned to the 4th (topmost) metal layer. The data stored in memory cells are read out via virtual-GND lines by sensing the change in current volume. The practical use of parasitic bipolar action in SOI MOSFETs is being actively considered as a way of obtaining a large read current from memory cells. In addition, a 1-V double-rail bidirectional intradatabus is developed for transferring multibit high-speed data between the SRAM core and I/O buffers. A 32K-word$,{times},$ 9-bit SRAM chip, fabricated with the 0.2- $mu$m-gate CMOS/SIMOX process, has achieved a 7.5-ns address access time for 65-pF external loads. The power dissipation during standby is less than 0.3 mW and the values for 100-MHz operation are 5.8$~$mW (write) and 11.0 mW (read), excluding that of the 3.3-V I/O buffers.
机译:使用具有不同输出电压的多个电源的巨大优势在于,它可以实现具有低功耗的高性能ULSI。本文介绍了采用三个电源(1、2和3.3 V)的高速低功耗SRAM。 SRAM内核主要使用1 V电源来节省待机和/或有功功率,而关键组件则使用2 V电源以实现高性能。由于使用了5nm超薄栅极氧化物,因此每个MOSFET的适用电压高达2.2V,因此3.3V电源仅用于LV-TTL电平I / O缓冲器。通过使用新的开关电源线阻抗方案,可以确保1-V六晶体管存储单元的安全写操作。为了减少动态写入功率耗散,采用分段位线方案,并且将长全局位线分配给第四层(最顶层)金属层。通过检测电流量的变化,可通过虚拟GND线读取存储在存储单元中的数据。积极考虑在SOI MOSFET中使用寄生双极型动作作为从存储单元获取大读取电流的一种方式。此外,还开发了一种1-V双轨双向内部数据总线,用于在SRAM内核和I / O缓冲器之间传输多位高速数据。采用0.2-μm栅极CMOS / SIMOX工艺制造的32K字,×,9位SRAM芯片,在65pF外部负载下的地址访问时间为7.5ns。待机期间的功耗小于0.3 mW,工作在100 MHz时的值为5.8 $〜$ mW(写)和11.0 mW(读),其中不包括3.3V I / O缓冲器。

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