首页> 外文期刊>Sensors Journal, IEEE >A - Solar-Blind Photodetector Prepared by Furnace Oxidization of GaN Thin Film
【24h】

A - Solar-Blind Photodetector Prepared by Furnace Oxidization of GaN Thin Film

机译:A-氮化镓薄膜的炉氧化制备的日盲光电探测器

获取原文
获取原文并翻译 | 示例

摘要

The authors report the growth of $beta$-$hbox{Ga}_{2} hbox{O} _{3}$ thin film by simple furnace oxidation of GaN thin film and the fabrication of a solar-blind $beta$-$hbox{Ga}_{2} hbox{O} _{3}$ photodetector (PD). For the PD with an active area of 4.4 ${hbox {mm}}^{2}$ and 5-V applied bias, it was found that measured current was only 1.39$,times 10 ^{-10}~hbox{A}$ in the dark and increased to 2.03 $,times 10 ^{-5}~hbox{A}$ when illuminated with 260-nm ultraviolet (UV) light (41.27 $muhbox{W}/{hbox {cm}}^{2}$). It was also found that the fabricated PD exhibits an extremely large deep-UV-to-visible rejection ratio.
机译:作者报告说,通过简单的GaN薄膜炉氧化和制造太阳盲$ beta $-可以增加$ beta $-$ hbox {Ga} _ {2} hbox {O} _ {3} $薄膜的增长。 $ hbox {Ga} _ {2} hbox {O} _ {3} $光电探测器(PD)。对于有效面积为4.4 $ {hbox {mm}} ^ {2} $且施加5V偏压的PD,测得的电流仅为1.39 $,乘以10 ^ {-10}〜hbox {A } $$在黑暗中增加到2.03 $,乘以260 nm紫外线(41.27 $ muhbox {W} / {hbox {cm}} ^乘以10 ^ {-5}〜hbox {A} $ {2} $)。还发现,所制造的PD表现出非常大的深UV-可见光拒绝比。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号