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Size and density control of InAs quantum dot ensembles on self-assembled nanostructured templates

机译:自组装纳米结构模板上InAs量子点集合的大小和密度控制

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New morphologies of InAs quantum dot ( QD) ensembles forming on self-assembled GaAs nano-holed island templates are demonstrated. Droplet homoepitaxy ( GaAs/GaAs) is used to generate holed nanoscale-sized mounds that appear to elongate along [ 0 1 (1) over bar]. Depending on the InAs monolayer ( ML) coverages, subsequent InAs deposition forms different sizes and shapes of QD ensembles. While we initially observe the formation of the QDs at the hole sites when less InAs is deposited, QDs form around the edges of the mounds with greater InAs deposition. By varying the InAs depositions and growth temperatures, we demonstrate an ability to control the size and density of QDs. The observed decrease in the necessary critical thickness required for the InAs 2D - 3D transition may be due to the higher density of monolayer steps on the sidewalls of the holes and on the edges of the mounds. This hybrid growth approach overcomes some limitations of typical QD growth on planar GaAs surfaces and may find applications in optoelectronics.
机译:展示了在自组装GaAs纳米孔岛模板上形成的InAs量子点(QD)集成体的新形态。液滴均质外延(GaAs / GaAs)用于产生有孔的纳米级土墩,这些土墩似乎沿[0 1(1)超过条形]延伸。根据InAs单层(ML)的覆盖率,后续的InAs沉积形成不同尺寸和形状的QD组件。当我们最初观察到当沉积较少的InAs时会在孔位处形成QD时,QD会在具有更大InAs沉积的土堆边缘周围形成。通过改变InAs沉积和生长温度,我们证明了控制QD尺寸和密度的能力。观察到的InAs 2D-3D过渡所需的必要临界厚度的减少可能是由于孔的侧壁和土墩的边缘上的单层台阶的密度较高。这种混合生长方法克服了平面GaAs表面上典型QD生长的某些局限性,并可能在光电学中找到应用。

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