机译:使用选择性干法蚀刻配方比较引入GaN / AlGaN / GaN异质结构的损伤
Department of Electronic and Electrical Engineering, University of Sheffield, Sheffield, S1 3JD, UK;
Department of Electronic and Electrical Engineering, University of Sheffield, Sheffield, S1 3JD, UK;
Department of Electronic and Electrical Engineering, University of Sheffield, Sheffield, S1 3JD, UK;
Department of Electronic and Electrical Engineering, University of Sheffield, Sheffield, S1 3JD, UK;
Department of Electronic and Electrical Engineering, University of Sheffield, Sheffield, S1 3JD, UK;
Department of Electronic and Electrical Engineering, University of Sheffield, Sheffield, S1 3JD, UK;
QinetiQ Ltd, St Andrews Road, Great Malvern, Worcestershire WR14 3PS, UK;
QinetiQ Ltd, St Andrews Road, Great Malvern, Worcestershire WR14 3PS, UK;
QinetiQ Ltd, St Andrews Road, Great Malvern, Worcestershire WR14 3PS, UK;
机译:具有选择性干蚀刻的凹入式栅极和极化电荷补偿δ掺杂GaN盖层的Si衬底上通常不包含AlGaN / GaN HEMT
机译:AlGaN / GaN异质结构在没有掩埋导电层的氯等离子体蚀刻GaN模板上的金属血管阶段外延
机译:AlGaN / GaN异质结构直接在反应离子蚀刻GaN上生长,显示高电子迁移率(> 1300cm〜2V〜(-1)S〜(-1))
机译:采用选择性干刻蚀技术的栅极阳极GaN-Cap / AlGaN / GaN HEMT二极管的低0.3V导通
机译:高性能紫外线光电探测器和LED和光电探测器的单片集成在SI上生长的P-GAN / AlGaN / GaN异质结构上的LED和PhotoTopetector
机译:角分辨X射线光电子能谱研究Al2O3封端的GaN / AlGaN / GaN异质结构的表面极化
机译:C掺杂的Aln / GaN Hemts和Aln / GaN / AlGaN双异质结构对MMW应用的比较
机译:GaN肖特基二极管中干蚀刻损伤的深度和热稳定性;应用物理快报