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Schottky barrier diode embedded AlGaN/GaN switching transistor

机译:肖特基势垒二极管嵌入式AlGaN / GaN开关晶体管

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摘要

We developed a Schottky barrier diode (SBD) embedded AlGaN/GaN switching transistor to allow negative current flow during off-state condition. An SBD was embedded in a recessed normally-off AlGaN/GaN-on-Si metal-oxide-semiconductor heterostructure field-effect transistor (MOSHFET). The fabricated device exhibited normally-off characteristics with a gate threshold voltage of 2.8 V, a diode turn-on voltage of 1.2 V, and a breakdown voltage of 849 V for the anode-to-drain distance of 8 μm. An on-resistance of 2.66 mΩcm~2 was achieved at a gate voltage of 16 V in the forward transistor mode. Eliminating the need for an external diode, the SBD embedded switching transistor has advantages of significant reduction in parasitic inductance and chip area.
机译:我们开发了一种嵌入了肖特基势垒二极管(SBD)的AlGaN / GaN开关晶体管,以在关断状态下允许负电流流过。将SBD嵌入在凹进的常关AlGaN / Si-GaN金属氧化物半导体异质结构场效应晶体管(MOSHFET)中。对于阳极到漏极的距离为8μm,制造的器件表现出常关特性,栅极阈值电压为2.8 V,二极管导通电压为1.2 V,击穿电压为849V。在正向晶体管模式下,栅极电压为16 V时,导通电阻为2.66mΩcm〜2。消除了对外部二极管的需求,SBD嵌入式开关晶体管具有显着减少寄生电感和芯片面积的优势。

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  • 来源
    《Semiconductor science and technology》 |2013年第12期|125003.1-125003.6|共6页
  • 作者单位

    School of Electronic and Electrical Engineering, Hongik University, 94 Wausan-ro, Mapo-gu, Seoul 121-791, Korea;

    School of Electronic and Electrical Engineering, Hongik University, 94 Wausan-ro, Mapo-gu, Seoul 121-791, Korea;

    School of Electronic and Electrical Engineering, Hongik University, 94 Wausan-ro, Mapo-gu, Seoul 121-791, Korea;

    School of Electronic and Electrical Engineering, Hongik University, 94 Wausan-ro, Mapo-gu, Seoul 121-791, Korea;

    School of Electrical and Computer Engineering, Cornell University, Ithaca, NY, USA;

    School of Electronic and Electrical Engineering, Hongik University, 94 Wausan-ro, Mapo-gu, Seoul 121-791, Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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