EUV Resists Designed for Low Acid Diffusion

摘要

Results show that covalent attachment of a PAG on a lithographic polymer has advantages for LWR and resolution for an EUV resist material. The polymer-bound PAG approach improves overall PAG homogeneity in the resist film and reduces the potential acid diffusion length. Other important advantages of the polymer-bound PAG approach: Improved exposurernlatitude and high intrinsic PAG solubility can be built into the lithographic polymer. We expect that through judicious use of PAG monomer precursors, many types of lithographic polymers can be designed and optimized for EUV and potentially 193 nm resist use.