EUV Resists based on Low Acid Diffusion - (PPT)

摘要

Polymer Bound PAG shows better resolution and LWR than Polymer Blend Resist. Photospeed is faster for polymer blend Resist at the same molar loading of PAG- due to higher acid diffusion length. Higher molar PAG loading improves resolution, photospeed, and LWR for Polymer Bound PAG Resist. Continuing to explore Acid diffusion length, activation energy of the leaving group, polymer tensile strength, and resist swelling property. Better underlayers and topcoats to control Out-of Band Radiation. EUV Stochastic Resist models continue work with KLA-Tencor.