EUV MITIGATION OF EUV SHOT NOISE REPLICATING INTO ACID SHOT NOISE IN PHOTO-SENSITIZED CHEMICALLY-AMPLIFIED RESIST

摘要

A method for mitigating shotgun noise in extreme ultraviolet (EUV) lithography and patterning of photo-sensitive chemically amplified resist (PS-CAR) is described. The method includes a first exposure of the EUV pattern to produce a photosensitizer and a second exposure at a wavelength different from the wavelength of the exposure of the first EUV pattern to produce an acid in the exposed areas during the exposure of the first EUV pattern , And the photosensitizer acts to amplify acid production and improve contrast. The resist may be exposed to heat, a liquid solvent, a solvent atmosphere, or a vacuum to mitigate the effect of EUV shatter noise on the photosensitizer concentration that may accumulate during exposure of the first EUV pattern.