Microscopic Measurement of Step Movement during Crystal Growth by Chemical Vapor Deposition

摘要

The design and operating procedure of apparatus for direct microscopic measurement of step movement during crystal growth is presented. The equipment consists of a microscope for observation of growth features, a reaction cell, furnace, and gas‐flow control system. The apparatus has been employed to investigate growth mechanisms operative during the deposition of germanium by dissociation of GeI2 in an open tube flow system.