Synthesis of hyperbranched polyacetals containing C-(4-t-butylbenz)calix[4] resorcinarene: Resist properties for extreme ultraviolet (EUV) lithography

摘要

We synthesized various hyperbranched polyacetals poly(t-BCRA[4]-co-BVOC), poly(t-BCRA[4]-co-BVOP), poly(t-BCRA[4]-co-BVOXP), poly(t-BCRA[4]-co-BVBC), and poly(t-BCRA[4]-co-TVCH) by the polyaddition of C-(4-t-butylbenz)calix[4]resorcinarene (t-BCRA [4]) with 1,4-bis(4-vinyloxy)cyclohexane (BVOC), 1,3-bis(vinyloxy) propane (BVOP), 1,5-bis(vinyloxy)-3-oxapentane (BVOXP), 4,4'-bis(vinyloxy)-1,1'-bicyclohexane (BVBC), and 1,3,5-tris(vinyloxy)cyclohexane (TVCH), respectively. The resist properties (resist sensitivities, outgassing on EUV exposure, thickness loss after soaking in aq. TMAH, and etching durability) were consistent with their structures. Overall, poly(t-BCRA[4]-co-BVOC) has a high potential as a next-generation resist material.