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首页> 外文期刊>IEEE Transactions on Plasma Science >Large-area multiarc ion beam source 'MAIS'
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Large-area multiarc ion beam source 'MAIS'

机译:大面积多弧离子束源“ MAIS”

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摘要

A pulsed large-area intense ion beam source is described in which the ion-emitting plasma is built up by an array of individual discharge units homogeneously distributed over the surface of a common discharge electrode. A particularly advantageous feature of the source is that for plasma generation and subsequent acceleration of the ions, only one common energy supply is necessary. This allows us to simplify the source design and provides inherent synchronization of plasma production and ion extraction. Results of investigations of the source performance for the production of a proton beam are presented. The maximum beam current achieved to date is on the order of 100 A, with a particle kinetic energy of 15-30 keV and a pulse length in the range of 10 /spl mu/s. Originally conceived for the production of proton beams, the source has recently been modified to allow the production of a metal ion beam. First tests using tungsten ions delivered encouraging results. Future activities will concentrate on the use of alternative-metal ions, carbon ions, and beams composed of mixed ion species.
机译:描述了一种脉冲大面积强离子束源,其中通过均匀地分布在公共放电电极表面上的单个放电单元的阵列来建立离子发射等离子体。该源的特别有利的特征是,对于等离子体产生和随后的离子加速,仅需要一个公共能量供应。这使我们能够简化离子源设计,并提供等离子体产生和离子提取的内在同步。给出了质子束产生源性能研究的结果。迄今为止,获得的最大电子束电流约为100 A,粒子动能为15-30 keV,脉冲长度为10 / spl mu / s。最初被认为是用于产生质子束的源,最近已对其进行了修改,以允许产生金属离子束。使用钨离子的首次测试提供了令人鼓舞的结果。未来的活动将集中在使用替代金属离子,碳离子和由混合离子物种组成的束中。

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