Source for the production of large-area, pulsed ions - and electron beams

摘要

the invention relates to a source for the generation of pulsed ion and electron beams. $a with her in its transverse mode beam profile at a large-scale flow of charged particles is generated. the vacuum bogenplasmaquelle is given by the total flow determining load in the parallel connection of ohmic resistance with a capacitor is to a safe ignition.this last is the impedance of the pulsspannungsgenerators leistungsangepau00dft.the dimensions of the electrical components to the electrodes taking into account default barriers allows in its transverse mode beam profile at homogeneous stream of charged particles, in one and the same ladungsteilchen in same zu00fcndelektroden or from a structured flow different teilchensorten in different zu00fcndelektrodenmaterial exists.