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Doped contacts for high-longevity optically activated, high-gain GaAs photoconductive semiconductor switches

机译:掺杂触点,用于高寿命的光激活,高增益GaAs光电导半导体开关

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摘要

The longevity of high-gain GaAs photoconductive semiconductor switches (PCSS) has been extended to over 100 million pulses. This was achieved by improving the ohmic contacts through the incorporation of a doped layer that is very effective in the suppression of filament formation, alleviating current crowding. Damage-free operation is now possible at much higher current levels than before. The inherent damage-free current capacity of the bulk GaAs depends on the thickness of the doped layers and is at least 100 A for a dopant diffusion depth of 4 /spl mu/m. This current could be increased by employing multiple switches connected in parallel. The contact metal has a different damage mechanism, and the threshold for damage (/spl sim/40-80 A) is not further improved beyond a dopant diffusion depth of about 2 /spl mu/m. In a diffusion-doped contact switch, the switching performance is not degraded at the onset of contact metal erosion, unlike a switch with conventional contacts. For fireset applications operating at 1-kV/1-kA levels and higher, doped contacts have not yet resulted in improved longevity. We employ multifilament operation and InPb solder/Au ribbon wirebonding to demonstrate <100-shot lifetime at 1-kV/1-kA.
机译:高增益GaAs光电导半导体开关(PCSS)的寿命已扩展到超过1亿个脉冲。这是通过掺入掺杂层来改善欧姆接触来实现的,该掺杂层在抑制细丝形成,减轻电流拥挤方面非常有效。现在可以在比以前更高的电流水平下实现无损运行。体GaAs的固有无损电流容量取决于掺杂层的厚度,并且对于4 / splμm/ m的掺杂剂扩散深度至少为100A。通过采用并联的多个开关可以增加电流。接触金属具有不同的损伤机制,并且损伤阈值(/ spl sim / 40-80 A)不会进一步提高,超过约2 / spl mu / m的掺杂剂扩散深度。与具有常规触点的开关不同,在扩散掺杂的触点开关中,在触点金属腐蚀开始时开关性能不会降低。对于在1-kV / 1-kA或更高水平下运行的火炉应用,掺杂触点尚未提高使用寿命。我们采用复丝操作和InPb焊料/ Au带状引线键合来证明在1-kV / 1-kA时<100发寿命。

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