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Investigation of Affecting Factors on the Hardness of Fluorine-Containing Amorphous Carbon Film Coated by Pulsed-Plasma Ablation

机译:脉冲等离子体烧蚀涂层含氟非晶碳膜硬度影响因素的研究

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摘要

Hardness control of fluorine-containing diamondlike carbon (F-DLC) film deposited by pulsed-plasma ablation (PPA) of polytetrafluoroethylene (PTFE) was investigated. During coating, one substrate was set at a downstream position (front position) in the direction of plasma acceleration from a PTFE block, whereas another substrate was set at a side position in the direction perpendicular to the plasma acceleration from the PTFE. A typical Raman spectrum of diamondlike carbon, including D and G peaks due to $hbox{sp}^{2}$ carbons, was observed only from the front substrate; on the other hand, such a spectrum was not clearly seen from the side substrate. The hardness of F-DLC was 5.7 GPa at the front position, whereas it was 0.4 GPa at the side position. These results indicated that the bombardment of accelerated plasma to the front substrate played an essential role to increase the film hardness. In order to further increase the hardness of F-DLC film with PPA, $hbox{H}_{2}hbox{O}$ addition to the chamber during coating was attempted. The hardness of F-DLC was increased up to 10.4 GPa at a chamber pressure of $5 times 10^{-4} hbox{torr}$ obtained by $hbox{H}_{2}hbox{O}$ addition to the base pressure less than $0.4 times hbox{10}^{-4} hbox{torr}$.
机译:研究了通过聚四氟乙烯(PTFE)的脉冲等离子体烧蚀(PPA)沉积的含氟类金刚石碳(F-DLC)膜的硬度控制。在涂布过程中,一个基板被放置在从PTFE块沿等离子体加速的方向的下游位置(前部位置),而另一基板被放置在与从PTFE进行等离子体加速的方向垂直的侧面位置。仅从前基板观察到典型的类金刚石碳的拉曼光谱,包括由于$ hbox {sp} ^ {2} $碳引起的D和G峰。另一方面,从侧面基板看不到这样的光谱。 F-DLC的硬度在正面位置为5.7 GPa,而在侧面位置为0.4 GPa。这些结果表明,加速等离子体轰击到前基板对增加膜硬度起着至关重要的作用。为了进一步增加具有PPA的F-DLC膜的硬度,尝试在涂布期间向腔室中加入$ hbox {H} _ {2} hbox {O} $。 F-DLC的硬度在$ 5的腔室压力下乘以$ hbox {H} _ {2} hbox {O} $加到基础上获得的10 ^ {-4} hbox {torr} $的压力增加到10.4 GPa。压力小于$ 0.4乘以hbox {10} ^ {-4} hbox {torr} $。

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