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Comparing hardness and wear data for tetrahedral amorphous carbon and hydrogenated amorphous carbon thin films

机译：比较四面体无定形碳和氢化非晶碳薄膜的硬度和磨损数据

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P. Lemoine; J. P. Quinn; P. Maguire; J. A. Mclaughlin;
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年度 2004
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1. Comparing hardness and wear data for tetrahedral amorphous carbon and hydrogenated amorphous carbon thin films [J] . P. Lemoine, J. P. Quinn, P. Maguire, Wear: an International Journal on the Science and Technology of Friction, Lubrication and Wear . 2004,第5a6期

机译：比较四面体非晶碳和氢化非晶碳薄膜的硬度和磨损数据
2. Effect of Annealing on the Optical and Chemical Bonding Properties of Hydrogenated Amorphous Carbon and Hydrogenated Amorphous Carbon Nitride Thin Films [J] . Richard Ritikos, Chow Chee Siong, Siti Meriam Ab. Gani, Japanese journal of applied physics . 2009,第10期

机译：退火对氢化非晶碳和氢化非晶氮化碳薄膜光学和化学键合性能的影响
3. Inhomogeneous structure in hydrogenated tetrahedral amorphous carbon thin films [J] . Lee DH., Walter KC., Nastasi M., Physical Review, B. Condensed Matter . 1999,第19期

机译：氢化四面体非晶碳薄膜的不均匀结构
4. In situ plasma analysis, fluorine incorporation, thermostability, stress, and hardness comparison of fluorinated amorphous carbon and hydrogenated amorphous carbon thin films deposited on Si by plasma enhanced chemical vapor deposition [C] . A.D.Glew, M.A.Cappelli, M.N.Touzelbaev, Symposium on low-dielectric constant materials . 1999

机译：原位等离子体分析，通过等离子体增强化学气相沉积法沉积在Si上的氟化非晶碳和氢化非晶碳薄膜的氟掺入，热稳定性，应力和硬度比较
5. Electrical and Electrochemical Properties of Nitrogen-Containing Tetrahedral Amorphous Carbon (ta-C) Thin Films. [D] . Yang, Xingyi. 2013

机译：含氮四面体非晶碳（ta-C）薄膜的电和电化学性质。
6. Released Plasmonic Electric Field of Ultrathin Tetrahedral-Amorphous-Carbon Films Coated Ag Nanoparticles for SERS [O] . Fanxin Liu, Chaojun Tang, Peng Zhan, -1

机译：用于SERS的超薄四面体-非晶碳薄膜包覆的Ag纳米粒子的等离子体电场释放
7. π bands and gap states from optical absorption and electron-spin-resonance studies on amorphous carbon and amorphous hydrogenated carbon films [O] . Dasgupta, D., Demichelis, F., Pirri, Candido, 1991

机译：来自非晶碳和非晶氢化碳膜的光吸收和电子自旋共振研究的π能带和能隙状态

Comparing hardness and wear data for tetrahedral amorphous carbon and hydrogenated amorphous carbon thin films

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