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首页> 外文期刊>Physical review >Decomposition, diffusion, and growth rate anisotropies in self-limited profiles during metalorganic vapor-phase epitaxy of seeded nanostructures
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Decomposition, diffusion, and growth rate anisotropies in self-limited profiles during metalorganic vapor-phase epitaxy of seeded nanostructures

机译:种子纳米结构的金属有机气相外延过程中自限分布中的分解,扩散和生长速率各向异性

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摘要

We present a model for the interplay between the fundamental phenomena responsible for the formation of nanostructures by metalorganic vapor phase epitaxy on patterned (001)/(lll)B GaAs substrates. Experiments have demonstrated that V-groove quantum wires and pyramidal quantum dots form as a consequence of a self-limiting profile that develops, respectively, at the bottom of V-grooves and inverted pyramids. Our model is based on a system of reaction-diffusion equations, one for each crystallographic facet that defines the pattern, and include the group III precursors, their decomposition and diffusion kinetics (for which we discuss the experimental evidence), and the subsequent diffusion and incorporation kinetics of the group-Ill atoms released by the precursors. This approach can be applied to any facet configuration, including pyramidal quantum dots, but we focus on the particular case of V-groove templates and offer an explanation for the self-limited profile and the Ga segregation observed in the V-groove. The explicit inclusion of the precursor decomposition kinetics and the diffusion of the atomic species revises and generalizes the earlier work of Biasiol et al. [Biasiol et al., Phys. Rev. Lett. 81,2962 (1998); Phys. Rev. B 65, 205306 (2002)] and is shown to be essential for obtaining a complete description of self-limiting growth. The solution of the system of equations yields spatially resolved adatom concentrations, from which average facet growth rates are calculated. This provides the basis for determining the conditions that yield self-limiting growth. The foregoing scenario, previously used to account for the growth modes of vicinal GaAs(OOl) and the step-edge profiles on the ridges of vicinal surfaces patterned with V-grooves during metalorganic vapor-phase epitaxy, can be used to describe the morphological evolution of any template composed of distinct facets.
机译:我们提出了一种模式,该模式负责在图案化的(001)/(III)B GaAs衬底上通过金属有机气相外延形成纳米结构的基本现象之间的相互作用。实验表明,V形槽量子线和金字塔形量子点是由于在V形槽和倒金字塔的底部分别形成的自限制轮廓而形成的。我们的模型基于反应扩散方程式系统,每个扩散方程式定义了一个模式,其中包括III类前驱体,它们的分解和扩散动力学(我们将讨论实验证据)以及随后的扩散和前体释放的III族原子的结合动力学。这种方法可以应用于任何构型,包括金字塔形量子点,但我们将重点放在V形槽模板的特殊情况上,并对V形槽中观察到的自限制轮廓和Ga偏析提供解释。明确包括前体分解动力学和原子种类的扩散,对Biasiol等人的早期工作进行了修正和推广。 [Biasiol等,Phys。牧师81,2962(1998);物理Rev.B 65,205306(2002)],并且被证明对于获得对自限性生长的完整描述是必不可少的。该方程组的解产生空间分辨的原子浓度,由此计算平均小平面生长速率。这为确定产生自限性生长的条件提供了基础。先前用于解释金属有机气相外延过程中邻近GaAs(OOl)的生长模式和邻近表面的脊上形成V形槽的台阶轮廓的上述情况可用于描述形态演化由不同方面组成的任何模板的集合。

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