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首页> 外文期刊>Physica Status Solidi. A, Applied Research >Electroreflectance and photoreflectance studies of AlGaN/GaN heterostructure with a QW placed inside AlGaN layer
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Electroreflectance and photoreflectance studies of AlGaN/GaN heterostructure with a QW placed inside AlGaN layer

机译:QGaN置于AlGaN层内部的AlGaN / GaN异质结构的电反射和光反射研究

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摘要

Photoreflectance and electroreflectance spectroscopies are used for characterization of a AlGaN/GaN heterostructure with a QW. Analysis of Franz-Keldysh oscillations in AlGaN and GaN layers allow calculation of the electric-field dependence on bias in these layers. It was possible to obtain the concentration of charge localized in the QW and the polarization charge located at the AlGaN/GaN interface. The piezoelectric polarization was calculated using the lattice constants obtained from X-ray diffraction. Combining this with the electroreflectance results allowed the difference of spontaneous polarization between AlGaN and GaN layers to be obtained.
机译:光反射和电反射光谱学用于表征具有QW的AlGaN / GaN异质结构。通过对AlGaN和GaN层中的Franz-Keldysh振荡进行分析,可以计算电场对这些层中偏压的依赖性。可以获得位于QW的电荷浓度和位于AlGaN / GaN界面的极化电荷的浓度。使用由X射线衍射获得的晶格常数来计算压电极化。将其与电反射率结果相结合,可以得到AlGaN和GaN层之间的自发极化差异。

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