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GalnN-based LED structures on selectively grown semi-polar crystal facets

机译:选择性生长的半极性晶体面上的基于GalnN的LED结构

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摘要

In conventional nitride-based light emitting diodes, huge internal electric fields lead to a reduced overlap of electron and hole wave functions in the active GalnN quantum wells as a consequence of the piezoelectricity of these polar materials. In order to minimize these internal fields while still maintaining the well-established c-direction as main epitaxial growth direction for high-quality low-defect-density layers, we have investigated semi-polar LED structures on the side-facets of triangular GaN stripes grown by selective area epitaxy. The reduced internal electric field could be confirmed by several spectro-scopic methods. We found a strongly facet dependent growth mechanism leading to very flat surfaces on {1101} facets as opposed to their {1122} counterparts. An increased indium uptake on semipolar { HOI} facets as compared to conventional c-plane layers helped to shift the LED.emission to longer wave lengths beyond 500 nm in the green spectral range despite the significantly reduced field-dependent Stark shift.
机译:在常规的基于氮化物的发光二极管中,由于这些极性材料的压电性,巨大的内部电场导致有源GalnN量子阱中电子和空穴波功能的重叠减少。为了使这些内部场最小化,同时仍将良好建立的c方向保持为高质量低缺陷密度层的主要外延生长方向,我们研究了三角形GaN条纹侧面上的半极性LED结构通过选择性区域外延生长。减少的内部电场可以通过几种光谱方法确认。我们发现强烈依赖于面的生长机制导致{1101}面上的表面非常平坦,而不是{1122}面上。与传统的c平面层相比,半极性{HOI}面上增加的铟吸收有助于将LED转移到绿色光谱范围内超过500 nm的更长波长,尽管与场有关的Stark位移明显减少。

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  • 来源
    《Physica status solidi》 |2010年第6期|p.1407-1413|共7页
  • 作者单位

    Institute of Optoelectronics, Ulm University, 89069 Ulm, Germany;

    Institute of Optoelectronics, Ulm University, 89069 Ulm, Germany;

    Institute of Semiconductor Physics, Ulm University, 89069 Ulm, Germany;

    Institute of Semiconductor Physics, Ulm University, 89069 Ulm, Germany;

    Central Facility of Electron Microscopy, Ulm University, 89069 Ulm, Germany;

    Central Facility of Electron Microscopy, Ulm University, 89069 Ulm, Germany;

    Institute of Experimental Physics, Otto von Guericke University, 39106 Magdeburg, Germany;

    Institute of Experimental Physics, Otto von Guericke University, 39106 Magdeburg, Germany;

    Institute of Experimental Physics, Otto von Guericke University, 39106 Magdeburg, Germany;

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  • 原文格式 PDF
  • 正文语种 eng
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  • 关键词

    growth; galnn; leds; morphology; selective area epitaxy;

    机译:增长galnn;leds;形态学;选择区外延;

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