首页> 外国专利> Excitation region comprising nanodots (also referred to as 'quantum dots') in a matrix crystal grown on Si substrate and made of AlyInxGa1-y-xN crystal (y ≧ 0, x 0) with zincblende structure (also called 'cubic'). and light-emitting device (LED and LD) obtained by using the same

Excitation region comprising nanodots (also referred to as 'quantum dots') in a matrix crystal grown on Si substrate and made of AlyInxGa1-y-xN crystal (y ≧ 0, x 0) with zincblende structure (also called 'cubic'). and light-emitting device (LED and LD) obtained by using the same

机译:激发区包括在Si衬底上生长的基质晶体中的纳米点(也称为“量子点”),该激发点由具有闪锌矿结构(也称为“立方”)的AlyInxGa1-y-xN晶体(y≥0,x> 0)制成。以及通过使用其获得的发光器件(LED和LD)

摘要

A light-emitting device comprising: a Si substrate (1); a buffer layer (2) formed on the Si substrate (1), the buffer layer (2) containing a BP crystal; an N-type GaN-based crystal (3) formed on the buffer layer (2) containing the BP crystal; and an excitation region comprising a sphalerite-type AlyInxGa1-y-xN basic crystal (y≥0, x 0) (5) formed on the n-type GaN-based crystal (3) and quantum dots (6 ) of AlyInxGa1-y-xN (y ≥ 0, x 0) formed inside the AlyInxGa1-y-xN base crystal (y ≥ 0, x 0) (5) of the sphalerite type and a higher In concentration containing as the AlyInxGa1-y-xN basic crystal (y≥0, x 0) (5) of the sphalerite type, and an In layer having a thickness of about 1 atomic layer between the buffer layer (2) and the crystal (3 ) based on GaN or an InGaN layer having a thickness of 0.5 to 2 nm and a comparatively high In content or an InAl mixed layer having a thickness of about 1 atomic layer and a comparatively high In content.
机译:一种发光器件,包括:Si衬底(1);和在Si衬底(1)上形成缓冲层(2),该缓冲层(2)包含BP晶体。在包含BP晶体的缓冲层(2)上形成的N型GaN基晶体(3);激发区域包括形成在n型GaN基晶体(3)上的闪锌矿型AlyInxGa1-y-xN基本晶体(y≥0,x> 0)(5)和AlyInxGa1-n的量子点(6)闪锌矿型AlyInxGa1-y-xN基础晶体(y≥0,x> 0)(5)内部形成的y-xN(y≥0,x> 0)(5)并且包含作为AlyInxGa1-y-闪锌矿型的xN基本晶体(y≥0,x> 0)(5),以及基于GaN或氮化镓的缓冲层(2)和晶体(3)之间的In层厚度约为1个原子层具有0.5至2nm的厚度和较高的In含量的InGaN层或具有大约1个原子层的厚度和较高的In含量的InAl混合层。

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