首页> 外文期刊>Physica status solidi >Experimental and theoretical study of electrical, thermal, and optical characteristics of InGaN/GaN high-power flip-chip LEDs
【24h】

Experimental and theoretical study of electrical, thermal, and optical characteristics of InGaN/GaN high-power flip-chip LEDs

机译:InGaN / GaN大功率倒装芯片LED的电,热和光学特性的实验和理论研究

获取原文
获取原文并翻译 | 示例

摘要

Comprehensive analysis of current spreading, temperature distribution, and near-field electroluminescence (ML) of high-power Hip-chip InGaN/GaN light-emitting diodes (LKDs) has been performed by combination of experimental and theoretical methods. High-resolution mapping of E.L and thermal radiation was obtained by optical and infra-red (IR) microscopes. Thermal resistance of the chip was measured by forward-voltage relaxation technique. 3D coupled electrical, thermal, and optical simulations were carried out using hybrid 1D/3D model. The theoretical predictions agree well with available observations. The lateral distributions of the near-field EL intensity and temperature are found to be qualitatively similar to that of the current density but to have substantially lower degree of non-uniformity. Therefore, it becomes incorrect to judge the current crowding in the LED chip by the measured contrast of the EL image. The role of contact resistances in stabilization of the current spreading pattern is revealed by modeling.
机译:通过实验和理论方法相结合的方法,对大功率Hip芯片InGaN / GaN发光二极管(LKD)的电流扩展,温度分布和近场电致发光(ML)进行了综合分析。 E.L和热辐射的高分辨率映射是通过光学和红外(IR)显微镜获得的。通过正向电压弛豫技术测量芯片的热阻。使用混合1D / 3D模型进行了3D耦合的电,热和光学仿真。理论上的预测与现有的观察结果非常吻合。发现近场EL强度和温度的横向分布在质量上类似于电流密度的横向分布,但是具有明显较低的不均匀度。因此,通过测量的EL图像的对比度来判断LED芯片中的电流拥挤是不正确的。通过建模揭示了接触电阻在稳定电流扩展模式中的作用。

著录项

  • 来源
    《Physica status solidi》 |2013年第3期|466-469|共4页
  • 作者单位

    Submicron Heterostractures for Microelectronics Research & Engineering Center, RAS, Polytekhnicheskaya 26, 194021 St. Petersburg, Russia;

    STR Group - Soft-Impact, Ltd., P.O. Box 83, 27 Engels av., 194156 St. Petersburg, Russia;

    STR Group - Soft-Impact, Ltd., P.O. Box 83, 27 Engels av., 194156 St. Petersburg, Russia;

    Submicron Heterostractures for Microelectronics Research & Engineering Center, RAS, Polytekhnicheskaya 26, 194021 St. Petersburg, Russia;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    current crowding; electroluminescence; flip-chip LEDs; Ⅲ-nitrides; simulation;

    机译:目前拥挤;电致发光倒装芯片LED;Ⅲ-氮化物;模拟;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号