机译:用碳掺杂的GaN /未掺杂的GaN多层缓冲结构抑制AlGaN / GaN MISHFET中的电流崩溃
School of Electronics Engineering, Kyungpook National University, Daehak-ro 80, Buk-gu, Daegu 702-701, Republic of Korea;
School of Electronics Engineering, Kyungpook National University, Daehak-ro 80, Buk-gu, Daegu 702-701, Republic of Korea;
School of Electronics Engineering, Kyungpook National University, Daehak-ro 80, Buk-gu, Daegu 702-701, Republic of Korea;
School of Electronics Engineering, Kyungpook National University, Daehak-ro 80, Buk-gu, Daegu 702-701, Republic of Korea;
School of Electronics Engineering, Kyungpook National University, Daehak-ro 80, Buk-gu, Daegu 702-701, Republic of Korea;
School of Electronics Engineering, Kyungpook National University, Daehak-ro 80, Buk-gu, Daegu 702-701, Republic of Korea;
School of Electronics Engineering, Kyungpook National University, Daehak-ro 80, Buk-gu, Daegu 702-701, Republic of Korea;
School of Electronics Engineering, Kyungpook National University, Daehak-ro 80, Buk-gu, Daegu 702-701, Republic of Korea;
AlGaN; GaN; doping; current collapse; MOCVD; heterostructure field-effect transistors;
机译:多层碳掺杂/非掺杂GaN缓冲对抑制AlGaN / GaN HFET中电流崩塌的影响
机译:缓冲器中类似受体的陷阱对E型AlGaN / GaN MISHFET的电流崩溃和泄漏的影响
机译:使用AlGaN / GaN / AlGaN双异质结构抑制增强模式基于GaN的HEMT中的电流崩塌
机译:多层碳掺杂/未掺杂GaN缓冲液对AlGaN / GaN HFET的电流塌陷的影响
机译:为改善AlGaN / GaN MOS-HFET中的阈值电压稳定性和电流崩塌抑制而研究ALD介电材料的研究。
机译:关于碳掺杂GaN中供体/受体补偿比的建模在横向GaN功率Hemts中的单一再现击穿电压和电流塌陷
机译:关于碳掺杂GaN中供体/受体补偿比的建模,在横向GaN功率Hemts中的单一再现击穿电压和电流塌陷
机译:铍掺杂GaN缓冲层对外延alGaN / GaN异质结构电子性质的邻近效应