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Photoluminescence of cubic InN films on MgO (001) substrates

机译:MgO(001)衬底上立方InN薄膜的光致发光

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摘要

We have studied photoluminescence from cubic InN films grown on MgO substrates with a cubic GaN underlayer by RF N_2 plasma molecular beam epitaxy. A single PL peak was observed at 0.47 eV, By analyzing the reflectance spectra of cubic InN films, we could derive the refractive index and-extinction coefficient, and found the band gap energy of cubicrnInN is 0.48 eV, indicating that the PL peak observed at 0.47 eV is due to the interband transition of cubic InN. The difference in the PL peak energy between hexagonal and cubic InN is in good agreement with that predicted by ab-initio calculations.
机译:我们已经通过RF N_2等离子体分子束外延研究了在具有立方GaN底层的MgO衬底上生长的立方InN薄膜的光致发光。在0.47 eV处观察到一个PL峰,通过分析立方InN薄膜的反射光谱,可以得出折射率和消光系数,发现cuirInInN的带隙能为0.48 eV,表明在0.47 eV是由于立方InN的带间跃迁。六方InN和立方InN之间的PL峰值能量之差与从头算的预测值相吻合。

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  • 来源
    《Physica status solidi》 |2008年第6期|1579-1581|共3页
  • 作者单位

    Department of Electrical and Electronic Systems, Saitama University, 255 Shimo-Okubo, Sakura-ku, Saitama 338-8570, Japan;

    Department of Electrical and Electronic Systems, Saitama University, 255 Shimo-Okubo, Sakura-ku, Saitama 338-8570, Japan;

    Department of Electrical and Electronic Systems, Saitama University, 255 Shimo-Okubo, Sakura-ku, Saitama 338-8570, Japan;

    Department of Electrical and Electronic Systems, Saitama University, 255 Shimo-Okubo, Sakura-ku, Saitama 338-8570, Japan CREST, JST, 4-1-8 Hon-cho, Kawaguchi, Saitama 332-0012, Japan;

    Department of Electrical and Electronic Systems, Saitama University, 255 Shimo-Okubo, Sakura-ku, Saitama 338-8570, Japan;

    Department of Electrical and Electronic Systems, Saitama University, 255 Shimo-Okubo, Sakura-ku, Saitama 338-8570, Japan CREST, JST, 4-1-8 Hon-cho, Kawaguchi, Saitama 332-0012, Japan;

    Department of Electrical and Electronic Systems, Saitama University, 255 Shimo-Okubo, Sakura-ku, Saitama 338-8570, Japan CREST, JST, 4-1-8 Hon-cho, Kawaguchi, Saitama 332-0012, Japan;

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  • 关键词

    thin film structure and morphology; Ⅲ-Ⅴ and Ⅱ-Ⅵ semiconductors; Ⅲ-Ⅴ semiconductors; molecular; atomic; ion; and chemical beam epitaxy;

    机译:薄膜的结构和形态;Ⅲ-Ⅴ和Ⅱ-Ⅵ族半导体;Ⅲ-Ⅴ族半导体;分子;原子;离子;和化学束外延;

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