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Trench MOSFETs: Large Die, Low Ohmic MOSFETs Cut On-Resistance, Gate Charge

机译:沟道MOSFET:大晶粒,低欧姆MOSFET降低了导通电阻,栅极电荷

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摘要

A new low voltage, 25 to 200V TrenchMOS technology, called SiliconMax, uses the largest die possible that can fit into a standard package. These devices offer very low R_(DS (on)) (on-resistance) and thermal performance that allows high density electronic designs. These devices also offer low gate charge or "Miller" charge, Q_(GD). To understand the importance of these benefits we must discuss the MOSFET's loss mechanisms: conduction, switching and gate drive losses.
机译:一种新的,电压为25V至200V的TrenchMOS低电压技术,称为SiliconMax,它使用了可以装入标准封装的最大裸片。这些器件具有非常低的R_(DS(on))(导通电阻)和热性能,可实现高密度电子设计。这些器件还提供低栅极电荷或“米勒”电荷Q_(GD)。要了解这些好处的重要性,我们必须讨论MOSFET的损耗机制:传导,开关和栅极驱动损耗。

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