首页> 外文会议>International Conference on Semantic Technology and Information Retrieval >Floating island and thick bottom oxide trench gate MOSFET (FITMOS) - a 60V ultra low on-resistance novel MOSFET with superior internal body diode
【24h】

Floating island and thick bottom oxide trench gate MOSFET (FITMOS) - a 60V ultra low on-resistance novel MOSFET with superior internal body diode

机译:浮岛和厚底氧化物沟槽栅极MOSFET(FITMOS) - 一种60V超低电阻新型MOSFET,具有卓越的内部体二极管

获取原文

摘要

A MOSFET structure named FITMOS has been successfully developed that exhibits record-low loss in the 60 volts breakdown voltage range. The breakdown voltage of 64 volts and specific on-resistance of 22mΩmm2 (Vgs=15V) this performance exceeds the unipolar limit (Chenming Hu, 1979). The device has a body diode with superior reverse recovery characteristics and exhibits an extremely small value for RonQgd. The distinctive feature of this device is the use of floating islands formed by self-alignment and trench gates with a thick oxide layer on the bottoms. This structure can also be used for the terminal portion of the device, so the increase in the number of fabrication processes is less than 5%. Moreover, the rate of nondefective gates in 3-by-4-mm rectangular devices on an 8-inch wafer is at least 98%.
机译:已成功开发出名为Fitmos的MOSFET结构,其在60伏特击穿电压范围内展出记录低损耗。该性能的击穿电压为64伏和22mmmm 2 (v gs = 15v)的电阻超过了单极极限(Chenming Hu,1979)。该装置具有具有优异的反向恢复特性的体二极管,并且对RONQGD表示极小的值。该装置的独特特征是使用通过在底部上具有厚厚的氧化物层的自对准和沟槽栅极形成的浮岛。该结构也可以用于器件的终端部分,因此制造过程的数量的增加小于5%。此外,在8英寸晶片上的3×4毫米矩形器件中的非漂白栅极的速率至少为98%。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号