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机译:等离子增强原子层沉积HfAlO薄膜的性能
State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system & Information Technology, Chinese Academy of Sciences, Changning Road 865, Shanghai 200050, People's Republic of China;
State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system & Information Technology, Chinese Academy of Sciences, Changning Road 865, Shanghai 200050, People's Republic of China;
State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system & Information Technology, Chinese Academy of Sciences, Changning Road 865, Shanghai 200050, People's Republic of China;
State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system & Information Technology, Chinese Academy of Sciences, Changning Road 865, Shanghai 200050, People's Republic of China;
State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system & Information Technology, Chinese Academy of Sciences, Changning Road 865, Shanghai 200050, People's Republic of China;
State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system & Information Technology, Chinese Academy of Sciences, Changning Road 865, Shanghai 200050, People's Republic of China;
State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system & Information Technology, Chinese Academy of Sciences, Changning Road 865, Shanghai 200050, People's Republic of China;
State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system & Information Technology, Chinese Academy of Sciences, Changning Road 865, Shanghai 200050, People's Republic of China;
HfAlO film; PEALD; Microstructure; Interface state density; Leakage current mechanism;
机译:通过原子层沉积和等离子体增强原子层沉积沉积的Ta_2O_5薄膜的纳米化学,纳米结构和电学性质
机译:等离子体增强原子层沉积HfO_2薄膜的热力学性质和界面层特性
机译:f源,氧化剂和NH_3 / Ar等离子体对原子层沉积制备HfAlO_x薄膜性能的影响
机译:通过衬底偏置控制通过等离子体增强原子层沉积法沉积的Al2O3薄膜的机械,结构和光学性质
机译:反馈控制的整合和运行控制对氧化铪薄膜的等离子体增强的原子层沉积
机译:等离子体增强原子层沉积在低温下沉积的HfO2薄膜的结构光学和电学性质
机译:使用等离子体增强的原子层沉积在低温下沉积HFO2薄膜的结构,光学和电性能