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Investigation of bias dependence on enhanced low dose rate sensitivity in SiGe HBTs for space application

机译:用于空间应用的SiGe HBT中增强的低剂量率敏感性的偏倚研究

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摘要

NPN silicon-germanium (SiGe) heterojunction bipolar transistors (HBTs) were exposed to ~(60)Co gamma source at different dose rates under two bias conditions. Excess base currents and normalized current gains are used to quantify performance degradation. Experiment results demonstrate that the lower the dose rate, the more the irradiation damage, and some enhanced low dose rate sensitivity (ELDRS) exists in SiGe HBTs. The ELDRS effect is found to depend highly on the bias condition during exposure, and the transistors with forward active mode exhibit a more serious ELDRS effect compared to the floating case. The performance degradation at different dose rates and bias conditions is compared and discussed, and furthermore the underlying physical mechanisms are analyzed and investigated in detail.
机译:NPN硅锗(SiGe)异质结双极晶体管(HBT)在两个偏置条件下以不同的剂量率暴露于〜(60)Coγ源。多余的基本电流和归一化电流增益用于量化性能下降。实验结果表明,SiGe HBT中剂量率越低,辐照损伤越大,并且低剂量率敏感性(ELDRS)增强。发现ELDRS效应在很大程度上取决于曝光期间的偏压条件,并且与浮动情况相比,具有正向有源模式的晶体管表现出更严重的ELDRS效应。比较和讨论了不同剂量率和偏置条件下的性能下降,并进一步分析和研究了潜在的物理机制。

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  • 作者单位

    Tsinghua National Laboratory for Information Science and Technology, Institute of Microelectronics, Tsinghua University, Beijing 100084, China;

    Tsinghua National Laboratory for Information Science and Technology, Institute of Microelectronics, Tsinghua University, Beijing 100084, China;

    Tsinghua National Laboratory for Information Science and Technology, Institute of Microelectronics, Tsinghua University, Beijing 100084, China;

    Tsinghua National Laboratory for Information Science and Technology, Institute of Microelectronics, Tsinghua University, Beijing 100084, China;

    Tsinghua National Laboratory for Information Science and Technology, Institute of Microelectronics, Tsinghua University, Beijing 100084, China;

    Tsinghua National Laboratory for Information Science and Technology, Institute of Microelectronics, Tsinghua University, Beijing 100084, China;

    Tsinghua National Laboratory for Information Science and Technology, Institute of Microelectronics, Tsinghua University, Beijing 100084, China;

    Tsinghua National Laboratory for Information Science and Technology, Institute of Microelectronics, Tsinghua University, Beijing 100084, China;

    Tsinghua National Laboratory for Information Science and Technology, Institute of Microelectronics, Tsinghua University, Beijing 100084, China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    ELDRS; Bias dependence; Dose rate; SiGe HBT;

    机译:ELDRS;偏倚剂量率硅锗;

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