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Comparison of small collection electrode CMOS pixel sensors with partial and full lateral depletion of the high-resistivity epitaxial layer

机译:小型收集电极CMOS像素传感器的局部和全横向耗尽高电阻率外延层

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Large area silicon pixel trackers are currently under development for the High Luminosity upgrade of the LHC detectors. They are also foreseen for the detectors proposed for the future high energy Compact Linear Collider CLIC. For the CLIC tracker a single hit resolution of 7 mu m, a timing resolution of a few nanoseconds and a material budget of 1-2% of radiation length per detection layer are required. Integrated CMOS technologies are promising candidates to reduce the cost, facilitate the production and to achieve a low material budget. CMOS sensors with a small size of the collection electrode benefit from a small sensor capacitance, resulting in a large signal to noise ratio and a low power consumption.The Investigator is a test-chip developed for the ALICE Inner Tracking System upgrade, implemented in a 180 nm CMOS process with a small collection electrode on a high resistivity epitaxial layer. The Investigator has been produced in different process variants: the standard process and a modified process, where an additional N-layer has been inserted to obtain full lateral depletion. This paper presents a comparison of test-beam results for both process variants, focuses on spatial and timing resolution as well as efficiency measurements.
机译:大面积硅像素跟踪器目前正在开发LHC探测器的高亮度升级。他们也预见到为未来的高能量紧凑型线性撞机Clic提出的探测器。对于CLIC跟踪器,需要7μm的单次命中分辨率,需要几纳秒的定时分辨率和每次检测层的1-2%的辐射长度的材料预算。集成的CMOS技术是有希望的候选人来降低成本,促进生产并实现低材料预算。 CMOS传感器具有小尺寸的收集电极的电容,从小传感器电容中受益,导致噪音比率大,功耗低。研究者是为Alice内部跟踪系统升级开发的测试芯片,实现在高电阻率外延层上具有小型收集电极的180nm CMOS工艺。研究者已经在不同的过程变体中产生:标准过程和修饰过程,其中插入额外的N层以获得完整的横向耗尽。本文介绍了两个过程变体的测试梁结果的比较,侧重于空间和时序分辨率以及效率测量。

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