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Improved spectroscopic performance in compound semiconductor detectors for high rate X-ray and gamma-ray imaging applications: A novel depth of interaction correction technique

机译:高速率X射线和伽马射线成像应用的化合物半导体检测器中的光谱性能:一种新的相互作用校正技术深度

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摘要

In this paper results are presented for a novel charge loss correction algorithm that exploits the process of charge induction within compound semiconductor detectors. By detecting the residual induced signals in the pixels neighbouring an event, it is possible to correct for variation in the charge collection efficiency that occurs when high energy photons deposit charge at different depths in the detector. Results from 500 mu m pitch pixel detectors produced from both GaAs: Cr and high-flux-capable CdZnTe material readout using the STFC's PIXIE ASIC are used to demonstrate the correction process across two different detector materials. The application of this depth of interaction correction results in a significant improvement in the FWHM of the 59.5 keV gamma-ray photopeak in a 0.5 mm thick GaAs:Cr sensor from 14 keV to 4.7 keV. The application of the correction at the higher energy 122 keV gamma-ray photopeak in a 2 mm thick CdZnTe detector also demonstrated an improvement from 4.0 keV to 2.7 keV.
机译:在本文中,提出了一种新的电荷损耗校正算法,其利用化合物半导体检测器内的电荷诱导过程。通过检测相邻事件的像素中的残余感应信号,可以校正当在检测器中不同深度处的高能光子沉积电荷时发生的充电收集效率的变化。由GaAs产生的500 mu m个间距像素探测器的结果:使用STFC的Pixie AsiC读出CR和高通量的Cdznte材料读出,用于展示两种不同探测器材料的校正过程。这种相互作用校正深度的应用导致0.5mm厚的GaAs中的59.5keV伽马射线PhotoPak的FWHM的显着改进:Cr传感器从14keV到4.7keV。在2mm厚的Cdznte检测器中,在较高能量122KeVγ射线照片处的校正的应用还展示了4.0keV至2.7 keV的改善。

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