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Geometrical integrity of micromold cavity sputtered by FIB using multilayer slicing approach

机译:FIB多层切片法溅射微模具腔的几何完整性

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摘要

This paper discusses the investigation of geometrical integrity of micromold cavity produced by focused ion beam (FIB) sputtering slice by slice. Parabolic shaped micromold cavity was chosen as an example. Preliminary experiments were carried out to characterize the machine and select the optimum process parameters such as beam current, pixel spacing, aperture size, and dwell time. The geometrical integrity of the sputtered micromold cavity was analyzed based on three selected criteria such as aspect ratio, cross-sectional area, and area offset. The theoretical and sputtered profiles were compared. The investigation showed that the measured aspect ratio was almost equal to the theoretical aspect ratio for low aspect ratio microcavity. For high aspect ratio cavity, the measured aspect ratio was higher than the theoretical aspect ratio by 5–8%. The area offset was found to be 5–10% of the theoretical area. The variation in theoretical and sputtered cross-sectional area was 2–4%. The characterization showed that the geometrical integrity of micromold cavity sputtered by FIB using slicing approach was high.
机译:本文讨论了聚焦离子束(FIB)逐片溅射产生的微模腔的几何完整性的研究。以抛物线形微模腔为例。进行了初步实验以表征机器并选择最佳工艺参数,例如束电流,像素间距,孔径大小和停留时间。基于三个选定的标准(如纵横比,横截面积和面积偏移)分析了溅射的微模具腔的几何完整性。比较了理论轮廓和溅射轮廓。研究表明,对于低纵横比的微腔,所测量的纵横比几乎等于理论纵横比。对于高深宽比的腔,测得的深宽比比理论深宽高5–8%。发现面积偏移为理论面积的5–10%。理论和溅射横截面积的变化为2-4%。表征表明,采用切片法,FIB溅射的微模腔的几何完整性较高。

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  • 来源
    《Microsystem Technologies》 |2007年第1期|103-107|共5页
  • 作者单位

    Department of Manufacturing and Materials Engineering Faculty of Engineering International Islamic University Malaysia Jalan Gombak 53100 Kuala Lumpur Malaysia;

    Precision Engineering and Nanotechnology Centre School of Mechanical and Aerospace Engineering Nanyang Technological University 50 Nanyang Avenue Singapore 639798 Singapore;

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