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An alternative approach to measure alpha-particle-induced SEU cross-section for flip-chip packaged SRAM devices: High energy alpha backside irradiation

机译:测量倒装芯片封装的SRAM器件的α粒子诱导的SEU横截面的另一种方法:高能α背面辐射

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To evaluate a device sensitivity against alpha particles, traditional Single Event Effect (SEE) tests are conducted using isotope source, which emits particles just above 5 MeV. Relentless downscaling and higher packing density have driven the demand of developing increasingly complex packaging: smaller, thinner, having enormous input/output pins count per chip. Flip-chip bonded devices meet all these demands, but their testing against alpha particles is a big challenge. The range of alpha ions, emitted by the isotope sources, is very short, which precludes their penetration till active circuit - from either side of the chip. This paper presents an evidence that high energy alpha irradiation can potentially be used to measure and correlate alpha SEE cross-section for such devices. The proposed method uses high energy alpha particles, directed from the backside of die, to mimic low energy (similar to 5 MeV) at the sensitive volume (SV). The incident particles penetrate the entire silicon substrate and deposit charge in the SV to induce upsets. The energy and LET of an ion at the SV, having traversed the entire substrate, is determined using TRIM. SEE experiments are performed on 14 nm FinFET SRAM devices, assembled in flip-chip and wire-bonded structures, respectively, for backside and traditional top-side testing. High energy alpha irradiations were simulated using CREME-MC - a Geant4 based Monte Carlo transport code. Tests and simulation results, for traditional and proposed methods, are presented for correlation. (C) 2016 Elsevier Ltd. All rights reserved.
机译:为了评估设备对α粒子的敏感性,传统的单事件效应(SEE)测试是使用同位素源进行的,同位素源发射的粒子刚好高于5 MeV。无休止的缩小尺寸和更高的封装密度推动了开发日益复杂的封装的需求:更小,更薄,每个芯片具有大量输入/输出引脚数。倒装芯片键合器件可以满足所有这些要求,但是针对α粒子进行测试是一个巨大的挑战。同位素源发出的α离子的范围非常短,这阻止了它们从芯片的任一侧进入有源电路的渗透。本文提供了一个证据,即高能α辐射可以潜在地用于测量和关联此类设备的αSEE横截面。所提出的方法使用从管芯的背面定向的高能α粒子来模拟敏感体积(SV)处的低能(类似于5 MeV)。入射粒子会穿透整个硅基板,并在SV中沉积电荷以引起不安。使用TRIM确定遍历整个基板的SV处离子的能量和LET。 SEE实验在分别装配为倒装芯片和引线键合结构的14 nm FinFET SRAM器件上进行,用于背面和传统的顶部测试。使用CREME-MC(基于Geant4的Monte Carlo传输代码)模拟了高能α辐射。提出了针对传统方法和拟议方法的测试和仿真结果,以进行相关性分析。 (C)2016 Elsevier Ltd.保留所有权利。

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