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首页> 外文期刊>Microelectronics journal >Long-wavelength emission from single InAs quantum dots layer grown on porous GaAs substrate
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Long-wavelength emission from single InAs quantum dots layer grown on porous GaAs substrate

机译:在多孔GaAs衬底上生长的单个InAs量子点层的长波发射

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摘要

In this paper, we present the growth and photoluminescence (PL) results of InAs quantum dots (QDs) on a p-type porous GaAs (001) substrate. It has been shown that critical layer thickness of InAs overgrowth on porous GaAs has been enhanced compared to that deposited on nominal GaAs. Using porous GaAs substrate, growth interruption and depositing 10 atomic monolayer (ML) In_(0.4)Ga_(0.6)As on InAs QDs, photoluminescence measured at 10 K exhibits an emission at 0.739 eV (~1.67 μm) with an ultranarrow full width at half maximum (FWHM) of 16 meV. This emission represents the longer wavelength obtained up to date to our knowledge and has been attributed to the radiative transition in the InAs QDs.
机译:在本文中,我们介绍了在p型多孔GaAs(001)衬底上InAs量子点(QD)的生长和光致发光(PL)结果。已经表明,与沉积在标称砷化镓上的InAs相比,在多孔GaAs上生长的InAs的临界层厚度有所增加。使用多孔GaAs衬底,生长中断并在InAs量子点上沉积10个原子单层(ML)In_(0.4)Ga_(0.6)As,在10 K下测得的光致发光显示出0.739 eV(〜1.67μm)的发射,在60nm处的超窄全宽半最大值(FWHM)为16 meV。这种发射代表了迄今为止所获得的更长的波长,这归因于InAs量子点中的辐射跃迁。

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