Developing an aberration-corrected Schottky emission SEM and method for measuring aberration

Takeshi Kawasaki; Tomonori Nakano; Kotoko Hirose

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Developing an aberration-corrected Schottky emission SEM and method for measuring aberration

机译：开发像差校正的肖特基发射SEM和测量像差的方法

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摘要

We have developed an aberration-corrected Schottky emission scanning electron microscope and a method for measuring aberration. The resolution has been improved from 1.5 to 1.2 nm and the contrast of low-magnification images has been improved by the aberration correction.

机译：我们已经开发了像差校正的肖特基发射扫描电子显微镜和一种测量像差的方法。分辨率从1.5纳米提高到1.2纳米，并且通过像差校正提高了低倍率图像的对比度。

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来源
《Microelectronic Engineering》 |2009年第6期|1017-1020|共4页
作者
Takeshi Kawasaki; Tomonori Nakano; Kotoko Hirose;
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作者单位

Central Research Laboratory, Hitachi Ltd., Kokubunji, Tokyo 185-8601, Japan;

Central Research Laboratory, Hitachi Ltd., Kokubunji, Tokyo 185-8601, Japan;

Central Research Laboratory, Hitachi Ltd., Kokubunji, Tokyo 185-8601, Japan;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
原文格式 PDF
正文语种 eng
中图分类
关键词
aberration correction; SEM; schottky emission;

机译：像差校正扫描电镜肖特基发射;

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Developing an aberration-corrected Schottky emission SEM and method for measuring aberration

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