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Direct epitaxial growth of InP based heterostructures on SrTiO_3/Si(0 0 1) crystalline templates

机译:InP基异质结构在SrTiO_3 / Si(0 0 1)晶体模板上的直接外延生长

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摘要

A study of the structural and optical properties of an InAsP/InP quantum well heterostructure grown on a crystalline SrTiO_3 (STO)/Si(0 0 1) template is presented. The mismatch between InP and STO is fully accommodated by an array of geometric dislocations confined at the heterointerface. As a consequence, InP takes its bulk lattice parameter as soon as growth begins, and does not contain threading dislocations related to plastic relaxation. It contains twins related to the initially three-dimensional growth. Despite these twins, photoluminescence from the quantum well is detected at room temperature, showing that STO/Si(0 0 1) templates have an interesting potential for the monolithic integration of III-V semiconductors on silicon.
机译:提出了在晶体SrTiO_3(STO)/ Si(0 0 1)模板上生长的InAsP / InP量子阱异质结构的结构和光学性质的研究。 InP和STO之间的不匹配完全由异质界面处的一系列几何位错解决。结果,InP会在生长开始后立即采用其整体晶格参数,并且不包含与塑性松弛相关的螺纹位错。它包含与最初的三维成长有关的双胞胎。尽管有这些孪生子,但在室温下仍可检测到来自量子阱的光致发光,这表明STO / Si(0 0 1)模板对于将III-V半导体单片集成到硅上具有令人感兴趣的潜力。

著录项

  • 来源
    《Microelectronic Engineering》 |2011年第4期|p.469-471|共3页
  • 作者单位

    Universite de Lyon, Ernie Centrale de Lyon, 1NL-UMR5270/CNRS, 36 avenue Guy de Collongue, 69134 Eculfy cedex, France;

    Universite de Lyon, Ernie Centrale de Lyon, 1NL-UMR5270/CNRS, 36 avenue Guy de Collongue, 69134 Eculfy cedex, France;

    Universite de Lyon, Ernie Centrale de Lyon, 1NL-UMR5270/CNRS, 36 avenue Guy de Collongue, 69134 Eculfy cedex, France;

    Universite de Lyon, Ernie Centrale de Lyon, 1NL-UMR5270/CNRS, 36 avenue Guy de Collongue, 69134 Eculfy cedex, France;

    Universite de Lyon, Ernie Centrale de Lyon, 1NL-UMR5270/CNRS, 36 avenue Guy de Collongue, 69134 Eculfy cedex, France;

    Universite de Lyon, Ernie Centrale de Lyon, 1NL-UMR5270/CNRS, 36 avenue Guy de Collongue, 69134 Eculfy cedex, France;

    LPN-UPR20/CNRS. Route de Nozay, 91460 Marcoussis, France;

    LPN-UPR20/CNRS. Route de Nozay, 91460 Marcoussis, France;

    Universite de Lyon, Ernie Centrale de Lyon, 1NL-UMR5270/CNRS, 36 avenue Guy de Collongue, 69134 Eculfy cedex, France;

    Universite de Lyon, Ernie Centrale de Lyon, 1NL-UMR5270/CNRS, 36 avenue Guy de Collongue, 69134 Eculfy cedex, France;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    molecular beam epitaxiy; highly dissimilar systems; accommodation; monolithic integration;

    机译:分子束外延;高度不同的系统;容纳;整体集成;

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