机译:聚对二甲苯钝化技术研究外延石墨烯表面电导率和量子霍尔器件的稳定性
NIST, Gaithersburg, MD 20899 USA;
NIST, Gaithersburg, MD 20899 USA;
NIST, Gaithersburg, MD 20899 USA;
NIST, Gaithersburg, MD 20899 USA;
NIST, Gaithersburg, MD 20899 USA;
NIST, Gaithersburg, MD 20899 USA;
NIST, Gaithersburg, MD 20899 USA;
NIST, Gaithersburg, MD 20899 USA;
NIST, Gaithersburg, MD 20899 USA;
NIST, Gaithersburg, MD 20899 USA;
NIST, Gaithersburg, MD 20899 USA;
NIST, Gaithersburg, MD 20899 USA;
NIST, Gaithersburg, MD 20899 USA;
Epitaxial graphene; Quantum Hall effect; Transport mobility; Surface conductivity; Parylene;
机译:外延石墨烯基量子霍尔效应器件的磁电容和耗散因数
机译:基于外延石墨烯的量子霍尔效应装置的磁致涂布和耗散因子
机译:基于外延石墨烯的量子霍尔效应装置的磁致涂布和耗散因子
机译:外延石墨烯中的交流量子霍尔效应
机译:碳化硅上的外延石墨烯薄膜:生长,表征和器件。
机译:聚对二甲苯钝化技术研究外延石墨烯表面电导率和量子霍尔器件的稳定性
机译:用聚对二甲烯钝化检查外延石墨烯表面电导率和量子霍尔器件稳定性