首页> 外文期刊>Materials science forum >Investigation of Additional States in the Silicon Carbide Surface after Diffusion Welding
【24h】

Investigation of Additional States in the Silicon Carbide Surface after Diffusion Welding

机译:扩散焊接后碳化硅表面附加态的研究

获取原文
获取原文并翻译 | 示例

摘要

This paper is a summary of the experimental study of deep levels in a SiC crystal lattice caused by diffusion welding (DW). Investigations were carried out by DLTS and Kelvin Probe methods. Investigations revealed that DLTS method is not applicable for identification of surface states. Research conducted by the Kelvin Probe method has shown an increase in the density of surface states after the diffusion welding from 2×l0~(15) cm~(-2 )to 3.5×l0~(16) cm~(-2).
机译:本文是对由扩散焊接(DW)引起的SiC晶格深层水平的实验研究的总结。研究是通过DLTS和Kelvin Probe方法进行的。调查表明,DLTS方法不适用于表面状态的识别。用开尔文探针法进行的研究表明,扩散焊接后表面状态的密度从2×10〜(15)cm〜(-2)增加到3.5×10〜(16)cm〜(-2)。

著录项

  • 来源
    《Materials science forum》 |2012年第1期|p.275-278|共4页
  • 作者单位

    Technical University of Budapest, Goldmann Gyter 3,H-1521 Budapest, Hungary;

    Department of Electronics, Tallinn University of Technology, Ehitajate tee 5, Tallinn,19086, Estonia;

    Department of Electronics, Tallinn University of Technology, Ehitajate tee 5, Tallinn,19086, Estonia;

    Department of Electronics, Tallinn University of Technology, Ehitajate tee 5, Tallinn,19086, Estonia;

    Department of Electronics, Tallinn University of Technology, Ehitajate tee 5, Tallinn,19086, Estonia;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    diffusion welding; deep levels; surface states; DLTS measurements; kelvin probe;

    机译:扩散焊接;深层次表面状态DLTS测量;开尔文探针;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号