机译:气流溅射沉积Co掺杂ZnO薄膜的微观结构和磁性
Research Division of Functional Materials Design, Graduate School of Engineering, Utsunomiya University, 7-1-2 Yoto, Utsunomiya 321-8585, Japan;
rnResearch Division of Functional Materials Design, Utsunomiya University, 7-1-2 Yoto, Utsunomiya 321-8585, Japan;
Sony Chemical & Information Device Corporation, 1078 Kamiishikawa, Kanuma 322-8503, Japan;
rnSony Chemical & Information Device Corporation, 1078 Kamiishikawa, Kanuma 322-8503, Japan;
rnResearch Division of Functional Materials Design, Utsunomiya University, 7-1-2 Yoto, Utsunomiya 321-8585, Japan;
rnSony Chemical & Information Device Corporation, 1078 Kamiishikawa, Kanuma 322-8503, Japan;
rnSony Chemical & Information Device Corporation, 1078 Kamiishikawa, Kanuma 322-8503, Japan;
Co-doped ZnO; gas flow sputtering; X-ray photoelectron spectroscopy; optical absorption; magnetic properties;
机译:(Al,CO)共掺杂ZnO薄膜的电气和磁性特性,由RF磁控溅射沉积
机译:退火对共溅射共掺杂ZnO薄膜微结构和磁性能的影响
机译:部分氮气流下溅射沉积的Fe-Pt薄膜的磁性能和微观结构
机译:RF-磁控溅射沉积Mn-Fe共掺杂ZnO薄膜的结构和磁性
机译:溅射沉积非晶非晶-thin薄膜的磁性和微观结构性质。
机译:射频磁控溅射制备(MgAl)共掺杂ZnO薄膜的光电性能研究与研究
机译:射频磁控溅射沉积ZnO薄膜的微观结构及其电学和光学性质的厚度依赖性