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Structure and magnetic properties of Mn-Fe co-doped ZnO thin films deposited by RF-magnetron sputtering

机译:RF-磁控溅射沉积Mn-Fe共掺杂ZnO薄膜的结构和磁性

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Thin films of Mn-Fe co-doped ZnO deposited onto borosilicate glass substrates by rf-magnetron sputtering in argon gas pressure. The as deposited thin films show hexagonal wurtizite structure, without any secondary phases of Mn or Fe in host ZnO within XRD limit. The crystallite (D) of the films decreases with increase in argon working gas pressure. The field emission scanning electron microscope (FE-SEM) images show dense microstructure with increases in average grain size as a function of argon gas pressure are about ~12 - 44 nm. The elemental composition of the as deposited thin filmswere confirmed by EDS spectra. The room temperature M-H plots show clear signature of ferromagnetic behavior with increase working gas pressure, the magnetic moment (M_s) of as deposited thin films is about 32 to 47 emu/cc as a function of working gas pressure. The increase in ferromagnetism in Mn-Fe co-doped ZnO thin films is due to coupled magnetic moments of multi atoms of Mn/Fe in host ZnO matrix.
机译:Mn-Fe共掺杂ZnO的薄膜通过RF-磁控溅射在氩气压中沉积在硼硅酸盐玻璃基板上。作为沉积的薄膜显示六边形水质型结构,在XRD限制内没有宿主ZnO中的Mn或Fe的任何二次相。薄膜的微晶(D)随着氩气工作气体压力的增加而降低。场发射扫描电子显微镜(Fe-SEM)图像显示致密微结构随着平均晶粒尺寸的增加,随着氩气压的函数约为12-44nm。由EDS光谱证实的作为沉积的薄膜薄膜的元素组成。室温M-H图显示了具有增加的工作气体压力的铁磁行为的清晰特征,作为沉积的薄膜的磁矩(M_S)为约32至47个EMU / CC,作为工作气体压力的函数。 Mn-Fe共掺杂ZnO薄膜中的铁磁性的增加是由于宿主ZnO基质中Mn / Fe的多原子的耦合磁矩。

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