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Investigation of Co-doped PZT films deposited by rf-magnetron sputtering

机译：用射频磁控溅射法制备共掺杂pZT薄膜的研究

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Felicia Gheorghiu; Radu Apetrei; Marius Dobromir; Adelina Ianculescu; Dumitru Luca; Liliana Mitoseriu;
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年度 2014
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1. Preparation and characterisation of PZT films by RF-magnetron sputtering [J] . Raluca Frunza, Dan Ricinschi, Felicia Gheorghiu Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics . 2011,第21期

机译：磁控溅射法制备PZT薄膜及其表征
2. Preparation and Characterization of Nano-Particles PZT Ferroelectric Thin Films by RF-Magnetron Sputtering [J] . FAN Panfeng, ZHANG Zhisheng, HU Ming Transactions of Tianjin University . 2006,第2期

机译：磁控溅射法制备纳米颗粒PZT铁电薄膜及其表征
3. Co-doped p-type ZnO:Al-N Thin Films Grown by RF-Magnetron Sputtering at Room Temperature [J] . Ramos Raul, Godoy Marcio Peron Franco de, Rangel Elidiane Cipriano, Materials Research . 2020,第3期

机译：共掺杂的p型ZnO：通过RF-agatchetron溅射在室温下生长的Al-N薄膜
4. Structure and magnetic properties of Mn-Fe co-doped ZnO thin films deposited by RF-magnetron sputtering [C] . V. Malapati, K. K. Venkataratnam, R. Singh DAE Solid State Physics Symposium . 2018

机译：RF-磁控溅射沉积Mn-Fe共掺杂ZnO薄膜的结构和磁性
5. Relationship between deposition parameters and the properties of RF-magnetron sputter deposited zirconia thin films. [D] . Ruddell, David Edward. 2002

机译：沉积参数与射频磁控溅射沉积氧化锆薄膜性能之间的关系。
6. Growth of CaxCoO2 Thin Films by A Two-Stage Phase Transformation from CaO–CoO Thin Films Deposited by Rf-Magnetron Reactive Cosputtering [O] . Biplab Paul, Jun Lu, Per Eklund 2019

机译：射频磁控反应共溅射沉积CaO–CoO薄膜的两相转变法生长CaxCoO2薄膜
7. Cu 4O3 thin films deposited by non-reactive rf-magnetron sputtering from a copper oxide target [O] . M. A. Cruz Almazán, E. Vigueras Santiago, R. López, 2021

机译：Cu 4O3通过从氧化铜靶溅射的非反应性RF-磁控溅射沉积的薄膜

Investigation of Co-doped PZT films deposited by rf-magnetron sputtering

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