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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Influence of annealing on microstructure and magnetic properties of co-sputtered Co-doped ZnO thin films
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Influence of annealing on microstructure and magnetic properties of co-sputtered Co-doped ZnO thin films

机译:退火对共溅射共掺杂ZnO薄膜微结构和磁性能的影响

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摘要

The annealing effects on the microstructure and magnetic properties of Zn0.92Co0.08O films annealed at different temperatures (200, 400 and 600 degrees C) in air and vacuum have been systematically investigated. The as-grown and annealed films are all highly textured with (002) orientation and all show room temperature ferromagnetism. The as-grown film is in a state of compressive stress and the film becomes almost stress-free after an annealing treatment at 400 degrees C in vacuum, while the film annealed at 600 degrees C goes into a state of tension. The magnetic moment increases after annealing in vacuum and decreases after annealing in air at the same temperature, compared with that of as-grown film. Moreover, the magnetic moment increases with the annealing temperature up to 400 degrees C and then shows a rapid decline at an annealing temperature of 600 degrees C in vacuum. The experimental results indicate that the enhancement of ferromagnetism is strongly correlated with the increase in oxygen vacancies and that the existence of interstitial Zn atoms plays an important role in mediating the ferromagnetism in Co-doped ZnO films.
机译:研究了退火对Zn0.92Co0.08O薄膜在不同温度(200、400和600摄氏度)下在空气和真空中退火的组织和磁性能的影响。所生长和退火的薄膜都具有(002)取向的高度织构,并且都显示出室温铁磁性。所生长的膜处于压缩应力状态,并且在真空中在400摄氏度下进行退火处理之后,该薄膜几乎变为无应力,而在600摄氏度下退火的薄膜则进入了拉伸状态。与生长的薄膜相比,在相同温度下在真空中退火后磁矩增加,而在相同温度下在空气中退火后磁矩减小。此外,磁矩随退火温度升高至400摄氏度而增加,然后在真空中于600摄氏度的退火温度下迅速下降。实验结果表明,铁磁性的增强与氧空位的增加密切相关,并且间隙Zn原子的存在在Co掺杂ZnO薄膜中介导铁磁性中起着重要作用。

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